Product Features
The catalyst is the precious metal (Pd) - Semiconductor system, through a special process development and production of new high-efficiency deoxidizing catalyst. Mainly used in hydrogen in addition to oxygen, but also for nitrogen, argon, helium and other inert gases and carbon monoxide, carbon dioxide hydrogenation oxygen.
Features
1. Precious metals (Pd) - Semiconductor system, high catalytic activity;
2. Without activation of regeneration, used for the first time without pretreatment;
3. Deep purification degree, residual oxygen is less than 0.5ppm;
4. Resistance to poisoning ability, especially for H2S, SO2, CL2, NH3 and other kinds of excellent resistance to poison ability;
5. Withstand high temperature, 650 ℃ not ablation (the similar products highest is 450 ℃);
6. High strength, not pulverization, consecutive years using activity.
Service conditions and Technical parameters:
1. Catalyst reactor height-diameter ratio: 3-5;
2. Temperature: room temperature (warming better);
3. Space velocity:≥ 5000hr-1;
4. Air oxygen content: ≤4%;
5. Purified gas residual oxygen content: ≤0.5ppm;
6. Visual shape: gray cylinder φ(2~6)mm;
7. Bulk density: 1.1 ± 0.1g/ml;
8. Working pressure: ≤27MPa;
9. Mechanical strength: 96N/grain;
10. Service life: ≥3years.
Application
Metallurgy, petroleum, chemicals, electronics, building materials, aerospace, pharmaceutical and other industries such as hydrogen and nitrogen, argon and other inert gases hydrogenation oxygen.