high purity vanadium pentoxide V2O5 sputtering target

1. We are manufacture and trading company in China .

2. GGJYsputtering target specializes in producing high purity target with the highest possible density and smallest possible average grain sizes for use in semiconductor, photovoltaic, and coating applications by chemical vapor deposition (CVD) and physical vapor deposition (PVD) and optical applications in a range of purities and sizes.

3. Our standard Rotatable Targets for large area thin film deposition are produced either by spray coating on a tubular substrate or casting of a solid tube.

4. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP).

5. we can also provide targets any size and shape, such as rectangular, annular, or oval targets. Materials are produced using crystallization , solid state and other ultra high purification processes such as sublimation.

6. GGJY specializes in producing custom compositions for commercial and research applications and for new proprietary technologies.

7. And also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form , as well as other machined shapes. We also produce Aluminum as disc, granules, ingot, pellets, pieces, powder, and rod. Other shapes are available by request.