Lab ALD Atomic layer deposition Coating System Deposition Al ,In2O3, Sn, F, fim materials
ALD Atomic layer deposition equipment for solar cell research
Application
It can be used for the preparation of conventional oxide thin films, elemental copper and nickel and TiN;
Can be connected to other vacuum devices such as glove boxes;
Upgradeable CCP system;
Ozone system can be installed, mainly used for silicon oxide, iron oxide and other processes
Optional
Optional ozone generator, in-situ film thickness measurement, fume hood, glove box, pump front adsorption (thermal adsorption, chemical adsorption and dust adsorption, etc.), cold trap, exhaust gas processor, etc.
Technical parameters:
|
Sample stage size |
4-12 inches |
|
Substrate heating temperature |
RT-400℃; ±1℃ |
|
Number of precursors |
4-8 |
|
Precursor source pipeline temperature |
RT-200℃; ±1℃ |
|
Source container temperature |
RT-200℃; ±1℃ |
|
Deposition mode |
fast mode, high aspect ratio mode, professional doping mode |
Pictures of Atomic Layer Deposition System:
Related coating machines:
Magnetron Plasma Sputtering Coater
Zhengzhou CY Scientific Instrument Co., Ltd.- is a high and new technology enterprise registered in Zhengzhou,Henan province. Zhengzhou CY Scientific Instrument Co., Ltd is mainly engaged in researching and developing, designing and manufacturing of equipment used in scientific researches.
Our mainly products include high temperature furnace and heating element, like lab muffle furnace, tube furnace, dental furnace, vacuum furnace,gold melting furnace, SiC heating element, MoSi2 heating element, alumina tubes and crucibles, and etc.
wooden case
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