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High Quality Durable Using Polycrystalline Diamond Polishing Powder
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Meorient Import & Export Co.LTD
China - Hangzhou
Trading Company
Trade Capacity
Export Percentage
Nearest Port
Hangzhou,Shanghai
Accepted Delivery Terms
Employees
5-10人
Accepted Payment Currency
USD,CNY
Average Lead Time
45 Day(s)
Certifications
Product Specifications
--Product Description
Products Description
Product name | Polycrystalline Diamond Powder |
Material | Polycrystalline Diamond |
colour | Grey |
Shape | Powder |
Size | 100CT, 2000CT |
MOQ | 1000 Carat |
Delivery date | 20 |
Sample package description | 500ml |
Application | Polycrystalline Diamond Powder |
Usage | scratches removal left by the metals |
LOGO customization | 10000kg |
Outer packaging customization | 10000kg |
Pattern customization | 10000kg |
Company Profile
SKYTON is a new and innovative company focusing on Chemical Mechanical Polishing (CMP) materials. We are both manufacturer and distributor.
We provide a broad range of products and solutions to customers in every worldwide consumer sector. Our products make sapphire, silicon wafer, mineral glass, ceramic polishing more effective, workpiece more strength, and finished good more attractive. Due to fast-moving markets, we provide performance solutions that solve customers' challenges today while preparing them to meet tomorrow’s needs.
Our innovative vision is based on a commitment to the most advanced technology. We invest in the research and development of products and solutions based on the fields of accuracy, safety, and green to anticipate the needs of consumer sectors.
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Workshop Diagram
Packing & Shipping
FAQ
Q:What does "CMP" mean?
A:"CMP" stands for Chemical Mechanical Polishing, which is a polishing/planarization process combined of chemical and mechanical action as to generate a substrate with smooth and planar surface.
Q:What are CMP components?
A:CMP components are including CMP slurry, which are usually different size of SiO2, Al2O3, CeO2 particles in nano scale,as well as Polishing Pad, which is usually porous materials made of polyurethane or other material with a rough surface. The pad help transporting the slurry and removing the polished substance away from time to time
Q:How can you find the best solution for your CMP process?
A:Based on your CMP parameters including substrate properties and polishing machines used, etc, Skyton could provide you the best solution for your process.
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